1- BatchEtch 

Saw Damage Etching

Removal of the mechanical saw damage after the wafer is cut.

More info……………. 

  2- BatchTex 

Texturing, alkaline/acidic

Fast texturing for high throughput  
Texturing tuning by RENA – We minimize the process time to achieve your optimum pyramid size distribution. You specify the wafer surface, we guarantee the reproducible texturing.

More info……………. 

                  3-  BatchClean 

Cleaning & HF/O3

Acidic cleaning processes for the removal of metallic surface contaminants, oxide and organic residues from the wafer surface.

More info……………. 
 
 
 
 
 
 
 

                 4- BatchOx 

Oxide Etching

The conventional process consists of the individual steps of etching, rinsing and drying. Advanced oxide etching using only one process bath makes a contribution towards quality improvement along the whole PV process chain. 

More info…………….